Physics of Microfabrication: Front End Processing
MIT OpenCourseWare offers this graduate-level electrical engineering course on the front-end processes used to fabricate silicon integrated circuit devices. Topics include oxidation, diffusion, ion implantation, and epitaxy, along with advanced physical models behind each process. The course also covers high performance MOS and bipolar device design, ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology techniques, and newer materials such as Silicon Germanium (SiGe). Materials are drawn from MIT's own graduate curriculum in the Electrical Engineering and Computer Science department, presenting both the theoretical models and the practical engineering constraints that shape modern chip manufacturing. As with other MIT OpenCourseWare offerings, the course provides lecture notes and course materials for self-study at no cost, released under a Creative Commons license, though no formal certificate or instructor support is included.